Evaporación de Ge sobre la superficie Al(111) : germaneno vs. aleación Ge-Al. / Ge evaporation on the Al (111) surface : germanene vs. Ge-Al alloy.

Martinez, Emanuel A. (2018) Evaporación de Ge sobre la superficie Al(111) : germaneno vs. aleación Ge-Al. / Ge evaporation on the Al (111) surface : germanene vs. Ge-Al alloy. Maestría en Ciencias Físicas, Universidad Nacional de Cuyo, Instituto Balseiro.

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Resumen en español

En este trabajo se presenta un estudio de la formación y crecimiento de películas delgadas de germanio sobre la supercie Al(111). Los experimentos se llevaron a cabo en los laboratorios del grupo de Física de Supercies del Centro Atómico Bariloche. Mediante evaporaciones de baja fuencia de Ge en Ultra Alto Vacío (UHV) y a temperaturas cercanas a 120°C, se observó la presencia de una fase estable 3x3 sobre la supercie Al(111). Adicionalmente, se observó una fase √7x√7 en coexistencia con la 3x3. Las mismas fases se hallan reportadas en los trabajos de Derivaz et al y [1] y Wang & Uhrberg [2], siendo consideradas por estos autores como fases auténticas de germaneno. Las investigaciones de este sistema fueron realizadas mediante Espectroscopía de Iones Dispersados con análisis por Tiempo De Vuelo (TOF-DRS), Difracción de Electrones de Baja Energía (LEED) y Espectroscopía de Fotoelectrones emitidos por rayos X (XPS), entre otras técnicas. Se determinó que el sistema Ge/Al(111) se trata de una mezcla de Ge y Al en la supercie y se muestran las contradicciones de los modelos vigentes frente a la nueva evidencia experimental. Finalmente, mediante cálculos de DFT y de Teoría Dinámica de LEED se encontró un modelo estructural consistente con los resultados presentados.

Resumen en inglés

In this work, formation and growth studies of germanium thin film on the Al(111) surface are presented. The experiments were carried out in the laboratories of the Surface Physics Group, Bariloche Atomic Centre. By using low-rate Ge evaporations, under Ultra High Vacuum (UHV) conditions and temperatures of about 120°C, a 3x3 stable phase was observed on the Al(111) surface. Additionally, a In this work, formation and growth studies of germanium thin lm on the Al(111) surface are presented. The experiments were carried out in the laboratories of the Surface Physics Group, Bariloche Atomic Centre. By using low-rate Ge evaporations, under Ultra High Vacuum (UHV) conditions and temperatures of about 120°C, a 3x3 stable phase was observed on the Al(111) surface. Additionally, a √7x√7 phase in coexistence with the 3x3 was observed under specic conditions. These phases are reported as authentic germanene phases by Derivaz et al [1] andWang & Uhrberg [2]. The system was investigated by means of Direct Recoil Spectroscopy with Time Of Flight analysis (TOF-DRS), Low Energy Electron Diffraction (LEED) and X-Ray Photoelectron Spectroscopy (XPS), among other techniques. The nature of the Ge/Al(111) system as a Ge-Al surface intermixing was determined. The contradictions between currently accepted models and the new experimental evidences are shown. Finally, through DFT and LEED Dynamic Theory calculations, a structural model in consistence with the presented results was found.

Tipo de objeto:Tesis (Maestría en Ciencias Físicas)
Palabras Clave:Germanene; Germaneno; Germanium; Germanio; Aluminium alloys; Aleaciones de aluminio; Electron diffraction; Spectroscopy; Espectroscopía; Electron diffraction; LEED
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Materias:Física > Física de superficie
Divisiones:Gcia. de área de Investigación y aplicaciones no nucleares > Gcia. de Física > Interacción de la radiación con la materia > Colisiones atómicas y físicas de superficies
Código ID:788
Depositado Por:Tamara Cárcamo
Depositado En:03 Feb 2021 10:50
Última Modificación:03 Feb 2021 10:50

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